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Title Surface topography analysis of water vapor plasma irradiation induced effects in Ті films
Authors Gedvilas, K.
Pranevicius, L.L.
Milcius, D.
ORCID
Keywords titanium
титан
water vapor
водяна пара
водяной пар
Type Conference Papers
Date of Issue 2011
URI http://essuir.sumdu.edu.ua/handle/123456789/20846
Publisher Видавництво СумДУ
License
Citation Gedvilas, K. Surface topography analysis of water vapor plasma irradiation induced effects in Ті films [Текст] / K. Gedvilas, L.L. Pranevicius, D. Milcius // Nanomaterials: applications & properties. Proceedings : 1-st International conference, Alushta, Crimea, 27-30 Semptember 2011 / Edited by: A. Pogrebnjak, T. Lyutyy, S. Protsenko. — Sumy : Sumy State University, 2011. — V.1, P.ІІ. — C. 420-427.
Abstract In the present work, the changes of surface topography driven by interaction of ions extracted from low-pressure water vapor plasma are studied. Titanium 0.5-1 um thickness films were deposited on silicon wafer substrates using magnetron sputtering technique and immersed in water vapor plasma at pressure 1-10 Pa. The samples were located on the cathode of magnetron and affected by high-flux, low-energy ions extracted by 250-300V bias negative voltage. The used Ti and W cathodes were water cooled. It is shown that the surface roughness of irradiated films changes in dependence of irradiation fluence and intensity. The experimental results are explained on the basis of the analysis of the selective erosion of oxide phases synthesized in the near-surface region. Three sputtering modes are distinguished: (i) metallic, (ii) oxide and (iii) composite: metallic with clusters of oxide. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/20846
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