The optimization of optical thin films deposition using in-situ reflectivity measurements and simulation

Bhatt, G.G.; Kheraj, V.; Desai, M.S.; Panchal, C.J.

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Title	The optimization of optical thin films deposition using in-situ reflectivity measurements and simulation
Authors	Bhatt, G.G. Kheraj, V. Desai, M.S. Panchal, C.J.
ORCID
Keywords	тонкие пленки тонкі плівки thin films моделирование моделювання simulation
Type	Article
Date of Issue	2011
URI	http://essuir.sumdu.edu.ua/handle/123456789/22079
Publisher	Видавництво СумДУ
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Citation	The optimization of optical thin films deposition using in-situ reflectivity measurements and simulation [Текст] / G.G. Bhatt, V. Kheraj, M.S. Desai, C.J. Panchal // Journal of Nano- and Electronic Physics. — 2011. — Vol.3, № 1, Part IV : Proceedings of the International Symposium on Semiconductor Materials and Devices (ISSMD-2011), Vadodara, India, 28-30 January 2011. — P. 721-727.
Abstract	We have optimized and automated the experimental in-situ reflectivity measurement system for the laser diode (LD) facet coating. We have also developed a reflectivitysimulator program that gives the reflectivity data as a function of the thickness of the film (single or multi-layer) for a given wavelength, which aids in optimizing the above parameters while monitoring the coating of the films in-situ. We report the results for the in-situ reflectivity of a single layer MgF2 and a quarter-wave optical thick three bi-layer pairs of MgF2 and silicon on GaAs as a substrate for both the cases. We have achieved up to 83 % experimental reflectivity for the latter case. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/22079
Appears in Collections:	Журнал нано- та електронної фізики (Journal of nano- and electronic physics)