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Title Magnetron sputtered Al-ZnO Thin films for photovoltaic applications
Authors Ray, J.R.
Desai, M.S
Panchal, C.J.
Patel, P.B.
ORCID
Keywords высокочастотное магнетронное распыление
rf magnetron sputtering
високочастотне магнетроне розпилення
Type Article
Date of Issue 2011
URI http://essuir.sumdu.edu.ua/handle/123456789/22105
Publisher Видавництво СумДУ
License
Citation Magnetron sputtered Al-ZnO Thin films for photovoltaic applications [Текст] / J.R. Ray, M.S. Desai, C.J. Panchal, P.B. Patel // Journal of Nano- and Electronic Physics. — 2011. — Vol.3, № 1, Part IV : Proceedings of the International Symposium on Semiconductor Materials and Devices (ISSMD-2011), Vadodara, India, 28-30 January 2011. — P. 755-765.
Abstract The optimization process of the RF magnetron sputtered Al - doped ZnO (AZO) thin films was carried out by studying its structural, optical, electrical, and morphological properties at different RF power and different working pressures for its use as a front-contact for the copper indium diselenide (CIS) based thin film solar cell. The structural study suggests that the preferred orientation of grains along the ( 002) plane having a hexagonal structure of the grains. The optical and electrical properties suggest that the films show an average transmission of 85 % and a resistivity of the order of 10-4 Wcm. The morphology analysis suggests the formation of packed grains having a homogeneous surface. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/22105
Appears in Collections: Журнал нано- та електронної фізики (Journal of nano- and electronic physics)

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