Formation of Nanostructured Thin Film Coatings for Nanocatalysts

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Title	Formation of Nanostructured Thin Film Coatings for Nanocatalysts
Authors	Tomilin, S.V. Yanovsky, A.S.
ORCID
Keywords	Nanostructuring Palladium Thermal annealing Vacuum deposition
Type	Article
Date of Issue	2012
URI	http://essuir.sumdu.edu.ua/handle/123456789/24908
Publisher	Видавництво СумДУ
License	Copyright not evaluated
Citation	S.V. Tomilin, A.S. Yanovsky, J. Nano-Electron. Phys. 4 No 1, 01013 (2012)
Abstract	The paper presents the results of theoretical basis of possibility of nanostructured thin-film formation by mechanical stress creation in ultra-thin films deposited on a substrate during their thermal annealing. The experiment results of palladium (Pd) ultra-thin films obtained on silicon (Si) substrates and their vacuum annealing are also presented. The samples were studied by AES and SEM methods. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/24908
Appears in Collections:	Журнал нано- та електронної фізики (Journal of nano- and electronic physics)