Structure of TiAlN Reactive Sputtered Coatings

Denisov, V.N.; Mavrin, B.N.; Vinogradov, E.A.; Polyakov, S.N.; Kirichenko, A.N.; Gogolinsky, K.V.; Useinov, A.S.; Blank, V.D.; Godinho, V.; Philippon, D.; Fernandez, A.

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Title	Structure of TiAlN Reactive Sputtered Coatings
Authors	Denisov, V.N. Mavrin, B.N. Vinogradov, E.A. Polyakov, S.N. Kirichenko, A.N. Gogolinsky, K.V. Useinov, A.S. Blank, V.D. Godinho, V. Philippon, D. Fernandez, A.
ORCID
Keywords	Coating Hardness Reactive Sputtering TiAlN
Type	Article
Date of Issue	2012
URI	http://essuir.sumdu.edu.ua/handle/123456789/24922
Publisher	Видавництво СумДУ
License	Copyright not evaluated
Citation	V.N. Denisov, B.N. Mavrin, E.A. Vinogradov, et al. J. Nano-Electron. Phys. 4 No 1, 01021 (2012)
Abstract	The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm 1 or in the region of 830 850 cm 1 depending on the deposition parameters whereas it is not exceed 630 cm 1 from TiAlN of NaCl structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiNx] with x = 5 and x = 4. The chains of polyhedra [TiNx] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N2 gas. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/24922
Appears in Collections:	Журнал нано- та електронної фізики (Journal of nano- and electronic physics)