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Title Effect of Impurity Concentration on the Depth Profile of the Electric Field within Monolayer Thin Film
Authors Habubi, N.F.
Mishjil, Kh.A.
Rashid, H.G.
ORCID
Keywords Electric field intensity
Matrix formulas
Contamination sensitivity
Type Article
Date of Issue 2012
URI http://essuir.sumdu.edu.ua/handle/123456789/27797
Publisher Сумський державний університет
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Citation N.F. Habubi, Kh.A. Mishjil, H.G. Rashid, J. Nano-Electron. Phys. 4 No 2, 24 (2012)
Abstract The effect of impurity concentration ratios on the depth profile of electric field within monolayer film is presented. SnO2 monolayer thin film material was prepared and doped with Co using spray chemical pyrolysis. The concentration ratios of impurity were 1 %, 3 %, 5 % and 7 %. The analysis utilizes matrix formulas based on Abele's formulas from the calculation of reflectance and transmittance. Present study gives an information to contamination sensitivity in optical coating issue. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/27797
Appears in Collections: Журнал нано- та електронної фізики (Journal of nano- and electronic physics)

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