Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System

Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/31006

Or use following links to share this resource in social networks: Recommend this item

Title	Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
Authors	Kumar, Avshish Parveen, Shama Husain, Samina Ali, Javid Harsh, Husain, M.
ORCID
Keywords	Carbon nanotubes PECVD RF sputtering Field emission Scanning electron microscopy Raman
Type	Article
Date of Issue	2013
URI	http://essuir.sumdu.edu.ua/handle/123456789/31006
Publisher	Сумський державний університет
License
Citation	Avshish Kumar, Shama Parveen, Samina Husain, et al., J. Nano- Electron. Phys. 5 No 2, 02012 (2013)
Abstract	Single wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm. The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were characterized by various techniques such as SEM, Raman study etc. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/31006
Appears in Collections:	Журнал нано- та електронної фізики (Journal of nano- and electronic physics)