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Title | Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation |
Authors |
Redko, S.V.
Chubenko, E.B. Klyshko, A.A. |
ORCID | |
Keywords |
Porous silicon Template Nanocomposites |
Type | Conference Papers |
Date of Issue | 2012 |
URI | http://essuir.sumdu.edu.ua/handle/123456789/35088 |
Publisher | Sumy State University |
License | Copyright not evaluated |
Citation | Redko, S. V. Porous Silicon Templates with High Aspect Ratio for Nanocomposites Formation / S. V. Redko, E. B. Chubenko, A. A. Klyshko // Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V. 1, No3. - 03CNN10 |
Abstract |
The paper describes the fabrication process of templates with high aspect ratio suitable for formation of
nanomposites with enhanced anisotropy. The templates are thick ordered porous silicon layers formed with
the pulsed galvanostatic mode. Characteristic feature of the developed mode is a short reversed polarity
pulse of certain amplitude. In the present paper the achieved thickness of porous silicon templates is
50 m with pore diameter 80 nm. The aspect ratio of those structures 1:600. The maximum thickness of
formed silicon layers is not principally limited allowing obtaining nanostructures with even higher aspect
ratio.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35088 |
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princon_2012_1_3_34.pdf | 410.32 kB | Adobe PDF | 50408834 |
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