Influence of Ion Current Density on the Properties of Vacuum Arc-deposited TiN Coating

Abstract

Influence of ion current density on the thickness of coating deposited in the vacuum arc setup has been investigated. A planar probe was used to measure the ion current density distribution across plasma flux at a distance of 250 mm from the plasma duct exit. The current density from 20 to 50 A/m2 was obtained, depending on the probe position relative to the substrate center. TiN coatings were deposited onto cutting inserts placed at different locations on the substrate, and SEM technique was used to characterize surfaces of the coatings. It was found that low-dense coatings were formed at the decreased ion current density. A quantitative dependence of the coating thickness on the ion current density in the range of 20 to 50 A/m2 were obtained for the films deposited at substrate bias of 200 V and nitrogen pressure 0.1 Pa. The results may be useful for controlling ion flux distribution over the large substrates. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35250