Please use this identifier to cite or link to this item:
http://essuir.sumdu.edu.ua/handle/123456789/35317
Or use following links to share this resource in social networks:
Tweet
Recommend this item
Title | Investigation of the Ga-rich GaAs(001) Surface Reconstructions Stability and Interaction with Halogens |
Authors |
Bakulin, A.V.
Kulkova, S.E. Tereshchenko, O.E. |
ORCID | |
Keywords |
Semiconductor Surface Electronic Structure Adsorption Halogens |
Type | Conference Papers |
Date of Issue | 2013 |
URI | http://essuir.sumdu.edu.ua/handle/123456789/35317 |
Publisher | Sumy State University |
License | |
Citation | Bakulin, A.V. Investigation of the Ga-rich GaAs(001) Surface Reconstructions Stability and Interaction with Halogens [Текст] / A.V. Bakulin, S.E. Kulkova, O.E. Tereshchenko // Nanomaterials: Applications & Properties (NAP-2013) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2013. - V.2, No1. - 01PCSI27 |
Abstract |
Atomic and electronic structures for a number of GaAs(001) surface geometries were studied within the density functional theory in order to re-examine the energy stability of surface reconstructions in the Ga-rich limit. It was shown that among geometries with (42) symmetry so-called ζ-model is most stable but the energetically favored Ga-rich (24) reconstructions are stabilized by dimerized Ga and As atoms. Our calculations predict the coexistence of (24) and (44) reconstructions on GaAs(001) in the Ga-rich limit. Comparative study of the halogens (F, Cl, I) adsorption on the -GaAs(001)-(42) surface were performed. The energetically preferable positions for all considered halogens are found on-top sites above dimerized and nondimerized Ga atoms. The electronic properties of the semiconductor surface and its change upon halogen adsorption are discussed. It was shown that the interaction of halogen with the Ga dimerized at-oms leads to the weakening of the chemical bonds between surface atoms that determines the initial stage of surface etching.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35317 |
Appears in Collections: |
Наукові видання (ЕлІТ) |
Views
Canada
1
China
3
Germany
6
Greece
1
Ireland
31383
Japan
1
Lithuania
1
Morocco
1
Netherlands
2025
Qatar
1
Russia
5
Singapore
3469101
Slovakia
3
Sweden
1
Turkey
1
Ukraine
307751
United Kingdom
155900
United States
6323574
Unknown Country
10297970
Vietnam
8100
Downloads
China
25
Germany
2
Lithuania
1
Mexico
1
Russia
1
Ukraine
307752
United Kingdom
1
United States
10297971
Unknown Country
40
Vietnam
1
Files
File | Size | Format | Downloads |
---|---|---|---|
princon_2013_2_1_70.pdf | 516.87 kB | Adobe PDF | 10605795 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.