The Dependence of the Magnetoresistance on the Orientation of Three-layer Film Systems Based on Со / n / Со (n = Gd, Dy, Bi) in an External Magnetic Field

Vorobiov, Serhii Ihorovych; Shutylieva, О.V.; Chornous, Anatolii Mykolaiovych

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Title	The Dependence of the Magnetoresistance on the Orientation of Three-layer Film Systems Based on Со / n / Со (n = Gd, Dy, Bi) in an External Magnetic Field
Authors	Vorobiov, Serhii Ihorovych Shutylieva, О.V. Chornous, Anatolii Mykolaiovych
ORCID	http://orcid.org/0000-0002-5884-3292 http://orcid.org/0000-0002-5009-5445
Keywords	Magnetoresistive properties Magnetoresistance Coercive force Three-layer film system Sensitivity Structural-phase state
Type	Conference Papers
Date of Issue	2013
URI	http://essuir.sumdu.edu.ua/handle/123456789/35349
Publisher	Sumy State University
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Citation	Vorobiov, S.I. The Dependence of the Magnetoresistance on the Orientation of Three-layer Film Systems Based on Ñî / n / Ñî (n = Gd, Dy, Bi) in an External Magnetic Field [Текст] / S.I. Vorobiov, Î.V. Shutylieva, À.M. Chornous // Nanomaterials: Applications & Properties (NAP-2013) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2013. - V.2, No1. - 01NFPMM08
Abstract	This work is devoted to general laws influence the orientation of the samples in an external magnetic field on the magnetic and magnetoresistive properties of three-layer film systems based on Со / n / Со (where n is intermediate layer of Gd, Dy and Bi). Found that the field dependence has anisotropic character, and most important magnetoresistance is observed in the perpendicular geometry measurement for all three-layer film systems. It is shown that the value of the coercive force and magnetoresistance decreases and the value of film sensitivity to the magnetic field increases in the transition from perpendicular to the transverse geometry. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35349
Appears in Collections:	Наукові видання (ЕлІТ)