Managing the Composition of the Plasma Flow of the Technological Plasma Sources by Changing the Temperature of the Cathode Working Surface

Sysoev, Yu.; Tatarkina, I.

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Title	Managing the Composition of the Plasma Flow of the Technological Plasma Sources by Changing the Temperature of the Cathode Working Surface
Authors	Sysoev, Yu. Tatarkina, I.
ORCID
Keywords	Plasma source Cathode working surface temperature Vacuum arc Dripping fraction
Type	Conference Papers
Date of Issue	2013
URI	http://essuir.sumdu.edu.ua/handle/123456789/35599
Publisher	Sumy State University
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Citation	Sysoev, Yu. Managing the Composition of the Plasma Flow of the Technological Plasma Sources by Changing the Temperature of the Cathode Working Surface [Текст] / Yu. Sysoev, I. Tatarkina // Nanomaterials: Applications & Properties (NAP-2013) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy: Sumy State University, 2013. - V.2, No3. - 03AET02
Abstract	The problems of managing the amount of drop fraction in the plasma flow of technological plasma vac-uum-arc discharge sources by controlling the changing the cathode surface temperature were considered. The possibilities for regulation and stabilization of cathode surface temperature by cooling the front and the lateral cathode surface were investigated. Designs of cathode assemblies in which the control of tem-perature of the working surface cathode is exercised by changing the coolant flow rate and by changing dis-tance between the cathode working surface and its cooling area were developed. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35599
Appears in Collections:	Наукові видання (ЕлІТ)