RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells

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Title	RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells
Authors	Zakhvalinskii, V.S. Piljuk, E.A. Goncharov, I.Yu. Rodriges, V.G. Kuzmenko, A.P. Taranenko, S.V. Abakumov, P.A.
ORCID
Keywords	Atomic force microscopy RF- magnetron sputtering Silicon carbide Silicon nitride Thin films Solar cells
Type	Article
Date of Issue	2014
URI	http://essuir.sumdu.edu.ua/handle/123456789/36380
Publisher	Sumy State University
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Citation	RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type.
Abstract	RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/36380
Appears in Collections:	Журнал нано- та електронної фізики (Journal of nano- and electronic physics)