High Temperature Annealing of Ion-Plasma Nanostructured Coatings Based on AlN-TiB2(TiSi2)

Pohrebniak, Oleksandr Dmytrovych; Bondar, Oleksandr Viacheslavovych; Beresnev, V.M.; Abadias, G.; Sobol, O.V.; Pshyk, A.V.; Kolesnikov, D.A.; Belovol, K.O.; Demianenko, A.A.; Komsta, H.

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Title	High Temperature Annealing of Ion-Plasma Nanostructured Coatings Based on AlN-TiB2(TiSi2)
Authors	Pohrebniak, Oleksandr Dmytrovych Bondar, Oleksandr Viacheslavovych Beresnev, V.M. Abadias, G. Sobol, O.V. Pshyk, A.V. Kolesnikov, D.A. Belovol, K.O. Demianenko, A.A. Komsta, H.
ORCID	http://orcid.org/0000-0002-9218-6492 http://orcid.org/0000-0003-3174-0709
Keywords	magnetron sputtering annealing damping properties
Type	Article
Date of Issue	2014
URI	http://essuir.sumdu.edu.ua/handle/123456789/38065
Publisher	Polish Academy of Sciences Institute of Physics
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Citation	High Temperature Annealing of Ion-Plasma Nanostructured Coatings Based on AlN-TiB2(TiSi2) [Text] / O.D. Pohrebniak, G. Abadias, O.V. Bondar [et al.] // Acta Physica Polonica A. — 2014. — Vol. 125, №6. — P. 1284-1287.
Abstract	The coatings investigated in this paper were deposited via the magnetron sputtering of AlN-TiB2(TiSi2) target in Ar atmosphere. The investigation of structural-phase composition, element composition, morphology and mechanical properties before and after annealing up to 1350 C was carried out. The concentration of elements in the coating was changed after annealing at 900 C and further annealing at 1350 C (especially after annealing at 1350 C). The hardness of as-deposited coatings was 15 GPa, but after annealing at 1350 C the value of hardness increased up to 22 - 23,5 GPa. The value of the viscoplastic index was 0.07. All this provide high damping properties of the coating, and amorphous-like structure makes promising the use of these coatings as diffusion barriers in the form of independent elements, and as a contacting layer in multilayer wear resistant coatings.
Appears in Collections:	Наукові видання (ЕлІТ)