Application of focused charge‐particle beams of in manufacturing of nanocomponents

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Title	Application of focused charge‐particle beams of in manufacturing of nanocomponents
Authors	Vorobiov, Hennadii Saveliiovych Ponomarev, А.G. Ponomareva, А.А. Drozdenko, Oleksii Oleksandrovych Rybalko, А.А.
ORCID	http://orcid.org/0000-0002-0047-739X
Keywords	manufacturing focused beam nanoelectronics beam litography
Type	Article
Date of Issue	2010
URI	http://essuir.sumdu.edu.ua/handle/123456789/3912
Publisher	Telecommunications and Radio Engineering
License	Copyright not evaluated
Citation	Application of focused charge-particle beams of in manufacturing of nanocomponents[Текст] /G.S.Vorobyov, А.G.Ponomarev, А.А.Ponomareva [та ін.] // Telecommunications and Radio Engineering. — 2010. — №69(4). — pp. 355-365
Abstract	Application of focused beams of medium energy light ions, electrons and low energy heavy ions is considered for the technology of manufacturing of small-dimension components. Physical principles applied as the basis for interaction of the above beams with resistive materials are described. The proton beam lithography is considered as a new technology possessing high potential capabilities for various applications like micro-optics and nanoelectronics of terahertz wave band. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/3912
Appears in Collections:	Наукові видання (ЕлІТ)