Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/3912
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Title Application of focused charge‐particle beams of in manufacturing of nanocomponents 
Authors Vorobiov, Hennadii Saveliiovych
Ponomarev, А.G. 
Ponomareva, А.А. 
Drozdenko, Oleksii Oleksandrovych  
Rybalko, А.А. 
ORCID http://orcid.org/0000-0002-0047-739X
Keywords manufacturing
focused  beam
nanoelectronics
beam litography
Type Article
Date of Issue 2010
URI http://essuir.sumdu.edu.ua/handle/123456789/3912
Publisher Telecommunications and Radio Engineering
License
Citation Application of focused charge-particle beams of in manufacturing of nanocomponents[Текст] /G.S.Vorobyov, А.G.Ponomarev, А.А.Ponomareva [та ін.] // Telecommunications and Radio Engineering. — 2010. — №69(4). — pp. 355-365
Abstract Application of focused beams of medium energy light ions, electrons and low energy heavy ions is considered for the technology of manufacturing of small-dimension components. Physical principles applied as the basis for interaction of the above beams with resistive materials are described. The proton beam lithography is considered as a new technology possessing high potential capabilities for various applications like micro-optics and nanoelectronics of terahertz wave band.  When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/3912
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