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Title | Optimization of Band Gap and Thickness for the Development of Efficient n-i-p+ Solar Cell |
Authors |
Belfar, A.
Amiri, B. Aït-Kaci, H. |
ORCID | |
Keywords |
Solar cells a-Si : H Thickness Window layer nc-SiOx : H Simulation AMPS-1D |
Type | Article |
Date of Issue | 2015 |
URI | http://essuir.sumdu.edu.ua/handle/123456789/41380 |
Publisher | Sumy State University |
License | |
Citation | A. Belfar, B. Amiri, H. Aït-kaci, J. Nano- Electron. Phys. 7 No 2, 02007 (2015) |
Abstract |
By using an electrical-optical AMPS-1D program (One Dimensional Analysis of Microelectronic and
Photonic structures), a n-i-p type solar cell, based on hydrogenated amorphous silicon (a-Si : H) and hydrogenated
nanocrystalline silicon oxide (nc-SiOx : H) has been investigated and simulated. The numerical
analysis describes the modeling of the external cell performances, like, the short-circuit current (JSC), the
open circuit voltage (VOC), the fill factor (FF) and efficiency (Eff) with the oxygen content in the p-ncSiOx
: H window layer by varying its mobility band gap (Eg) associated simultaneously to the effect of the
absorber layer (i-a-Si : H) thickness. Also, the i-a-Si : H absorber layer band gap was optimized. The simulation
result shows that the VOC depend strongly on the band offset (ΔEV) in valence band of p-side. But,
VOC does not depend on the thickness of the intrinsic layer. However, VOC increases when the energy band
gap of the intrinsic layer is higher. It is demonstrated that the highest efficiency of 10.44 %
(JSC = 11.67 mA/cm2; FF = 0.829; VOC = 1070 mV) has been obtained when values of p-nc-SiOx : H window
layer band gap, i-a-Si : H absorber layer band gap and i-a-Si : H absorber layer thickness are 2.10 eV,
1.86 eV, and 550 nm, respectively. |
Appears in Collections: |
Журнал нано- та електронної фізики (Journal of nano- and electronic physics) |
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File | Size | Format | Downloads |
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Belfar.pdf | 571.92 kB | Adobe PDF | -291238671 |
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