Ion Recrystallization and Spheroidization in Amorphous AlN-TiB2-TiSi2 as a Result of Annealing and Subsequent Implantation by Negative ion Au –

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Title	Ion Recrystallization and Spheroidization in Amorphous AlN-TiB2-TiSi2 as a Result of Annealing and Subsequent Implantation by Negative ion Au –
Authors	Demianenko, A.O. Bondar, O.V. Honcharov, Oleksandr Andriiovych Partyka, J. Borba, S.
ORCID	http://orcid.org/0000-0002-9275-0073
Keywords	Annealing Implantation Nanocomposite Phases Ions Au Amorphous
Type	Conference Papers
Date of Issue	2015
URI	http://essuir.sumdu.edu.ua/handle/123456789/42783
Publisher	Sumy State University
License	Copyright not evaluated
Citation	Ion Recrystallization and Spheroidization in Amorphous AlN-TiB2-TiSi2 as a Result of Annealing and Subsequent Implantation by Negative ion Au – [Текст] / A.O. Demianenko, O.V. Bondar, A.A. Goncharov et al. // Nanomaterials: Applications & Properties (NAP-2015) : Proceedings of the International Conference. — Sumy : Sumy State University, 2015. — V.4, No1. — 01PISERE02.
Abstract	This paper presents new results on investigation of the influence of Au- negative ion beam implantation and thermal annealing under 900 °C and 1300 °C on structure and characteristics of AlN-TiB2-TiSi2 coatings prepared by magnetron sputtering. Using scanning electron microscope (SEM) with microanalysis (EDS), atomic force microscopy (AFM), X-Ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) investigated the crystal structure, surface topography, microstructure were characterized.
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