Temperature Influence on the Properties of Thin Si3N4 Films

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Title	Temperature Influence on the Properties of Thin Si3N4 Films
Authors	Zakhvalinskii, V.S. Abakumov, P.V. Kuzmenko, A.P. Chekadanov, A.S. Piljuk, E.A. Rodriguez, V.G. Goncharov, I.J. Taran, S.V.
ORCID
Keywords	raman spectroscopy small-angle x-ray scattering atomic force microscopy
Type	Article
Date of Issue	2015
URI	http://essuir.sumdu.edu.ua/handle/123456789/43269
Publisher	Sumy State University
License	Copyright not evaluated
Citation	Zakhvalinskii, V.S. Temperature Influence on the Properties of Thin Si3N4 Films [Текст] / V.S. Zakhvalinskii, P.V. Abakumov, A.P. Kuzmenko et al. // Журнал нано- та електронної фізики. — 2015. — Т.7, №4. — 04052-1.
Abstract	Applying Raman spectroscopy, small-angle x-ray scattering, and atomic force microscopy it were studied phase composition and surface morphology of nanoscale films Si3N4 (obtained by RF magnetron sputtering).
Appears in Collections:	Журнал нано- та електронної фізики (Journal of nano- and electronic physics)