Thin overlayer influence on electrophysical properties of nickel films

Chornous, Anatolii Mykolaiovych; Hovorun, Tetiana Pavlivna

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Title	Thin overlayer influence on electrophysical properties of nickel films
Authors	Chornous, Anatolii Mykolaiovych Hovorun, Tetiana Pavlivna
ORCID	http://orcid.org/0000-0002-5009-5445 http://orcid.org/0000-0002-9384-5250
Keywords	thin films resistivity reflection coefficient тонкі плівки питомий опір коефіцієнт відбиття тонкие пленки удельное сопротивление коэффициент отражения
Type	Article
Date of Issue	2006
URI	http://essuir.sumdu.edu.ua/handle/123456789/583
Publisher	WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
License	Copyright not evaluated
Citation	Hovorun T. Thin overlayer influence on electrophysical properties of nickel films [Text] / T. Hovorun, A. Chornous // Cryst. Res. Technol. 41, No 5, 458 - 463 (2006).
Abstract	In this work it is experimentally investigated a size effect in temperature coefficient of resistance (TCR) of Ni films with Cu and Si02 thin overiayer. The parameters of electrical transfer (the mean-free path of electron, the reflectivity coefficient of the external surfaces, the reflection and transmission coefficients at the grain boundary) were calculations. Decreasing of the value of the reflectivity coefficient is due to the change of the surface microrelief. It is show that the value of TCR decreases caused by the conditions of scattering changes on internal and external boundaries. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/583
Appears in Collections:	Наукові видання (ЕлІТ)