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Title Development of Magnetic Field-enhanced Vacuum Arc Deposition in China
Authors Zhao, Ya.
Lang, W.C.
Xiao, J.Q.
Yu, B.H.
Gong, J.
Sun, C.
ORCID
Keywords Vacuum arc deposition
Magnetic field
Cathode spot motion
Droplet-particles reduction
Type Article
Date of Issue 2014
URI http://essuir.sumdu.edu.ua/handle/123456789/37232
Publisher Sumy State University
License
Citation Proc. NAP 3, 01PISERE01 (2014)
Abstract This paper reviews the latest research and development in China for magnetic field-enhanced vacuum arc deposition (MFE-VAD). China has developed some new technologies in MFE-VAD. These technologies are all based on the interaction between the magnetic field and cathode arc spot (and arc plasma). An external magnetic field can be applied to steer the cathode spot motion including axisymmetric magnetic field (AMF), transverse rotating magnetic field (TRMF) and coupling magnetic field (CMF). The transverse component of AFM can accelerate the cathode spot motion. The TRMF covered the whole cathode was generated by stationary three-phase windings carrying three-phase alternating currents. The CMF was designed to improve the increasing of plasma density and the collisions between ion and droplet-particls (DPs) charging, and as well as further purify the DPs.
Appears in Collections: Наукові видання (ЕлІТ)

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China China
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