Development of Magnetic Field-enhanced Vacuum Arc Deposition in China

Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/37232

Or use following links to share this resource in social networks: Recommend this item

Title	Development of Magnetic Field-enhanced Vacuum Arc Deposition in China
Authors	Zhao, Ya. Lang, W.C. Xiao, J.Q. Yu, B.H. Gong, J. Sun, C.
Keywords	Vacuum arc deposition Magnetic field Cathode spot motion Droplet-particles reduction
Type	Article
Date of Issue	2014
URI	http://essuir.sumdu.edu.ua/handle/123456789/37232
Publisher	Sumy State University
License
Citation	Proc. NAP 3, 01PISERE01 (2014)
Abstract	This paper reviews the latest research and development in China for magnetic field-enhanced vacuum arc deposition (MFE-VAD). China has developed some new technologies in MFE-VAD. These technologies are all based on the interaction between the magnetic field and cathode arc spot (and arc plasma). An external magnetic field can be applied to steer the cathode spot motion including axisymmetric magnetic field (AMF), transverse rotating magnetic field (TRMF) and coupling magnetic field (CMF). The transverse component of AFM can accelerate the cathode spot motion. The TRMF covered the whole cathode was generated by stationary three-phase windings carrying three-phase alternating currents. The CMF was designed to improve the increasing of plasma density and the collisions between ion and droplet-particls (DPs) charging, and as well as further purify the DPs.
Appears in Collections:	Наукові видання (ЕлІТ)