Structural Properties of the SnxSy Films Obtained by the Thermal Vacuum Co-evaporation

dc.contributor.authorVoznyi, A.A.
dc.contributor.authorKosyak, V.V.
dc.contributor.authorОпанасюк, Анатолій Сергійович
dc.contributor.authorОпанасюк, Анатолий Сергеевич
dc.contributor.authorOpanasiuk, Anatolii Serhiiovych
dc.contributor.authorKuznetsov, V.М.
dc.date.accessioned2014-10-28T14:10:59Z
dc.date.available2014-10-28T14:10:59Z
dc.date.issued2014
dc.description.abstractThe present work deals with the study of the structural properties of the SnxSy thin films deposited by the closed-spaced vacuum co-evaporation (CSVCE) method. Calculation of temperature dependencies of the sulfur and tin vapor pressures allows to estimate growth conditions of the films with the stoichiometric composition. The effect of growth conditions on surface morphology and structural properties of SnxSy films were studied. Surface morphology of obtained films was determined by the scanning electron microscope (SEM-102Е). Structural investigations of the films were performed with the X-ray diffraction (XRD) method. The analysis of chemical composition of the layers was carried out by the scanning electron microscope by energy dispersive X-ray (ЕDAX) spectroscopy. Influence of the substrate temperature on chemical composition of thin films and their structural characteristics was also investigated.ru_RU
dc.identifier.citationProc. NAP 3, 01NTF26 (2014)ru_RU
dc.identifier.sici0000-0002-1888-3935en
dc.identifier.urihttp://essuir.sumdu.edu.ua/handle/123456789/37173
dc.language.isoenru_RU
dc.publisherSumy State Universityru_RU
dc.rights.uricneen_US
dc.subjectThin Filmsru_RU
dc.subjectSnxSyru_RU
dc.subjectCo-evaporationru_RU
dc.subjectSurface morphologyru_RU
dc.subjectX-ray diffractionru_RU
dc.subjectCrystal structureru_RU
dc.titleStructural Properties of the SnxSy Films Obtained by the Thermal Vacuum Co-evaporationru_RU
dc.typeArticleru_RU

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