Magnetron sputtered Al-ZnO Thin films for photovoltaic applications
No Thumbnail Available
Files
Date
2011
Journal Title
Journal ISSN
Volume Title
Publisher
Видавництво СумДУ
Article
Date of Defense
Scientific Director
Speciality
Date of Presentation
Abstract
The optimization process of the RF magnetron sputtered Al - doped ZnO (AZO) thin films was carried out by studying its structural, optical, electrical, and morphological
properties at different RF power and different working pressures for its use as a front-contact for the copper indium diselenide (CIS) based thin film solar cell. The structural study suggests that the preferred orientation of grains along the ( 002)
plane having a hexagonal structure of the grains. The optical and electrical properties suggest that the films show an average transmission of 85 % and a resistivity of the order of 10-4 Wcm. The morphology analysis suggests the formation of packed grains
having a homogeneous surface.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/22105
Keywords
высокочастотное магнетронное распыление, rf magnetron sputtering, високочастотне магнетроне розпилення
Citation
Magnetron sputtered Al-ZnO Thin films for photovoltaic applications [Текст] / J.R. Ray, M.S. Desai, C.J. Panchal, P.B. Patel // Journal of Nano- and Electronic Physics. — 2011. — Vol.3, № 1, Part IV : Proceedings of the International Symposium on Semiconductor Materials and Devices (ISSMD-2011), Vadodara, India, 28-30 January 2011. — P. 755-765.