Patel, K.J.Bhatt, G.G.Ray, J.R.Patel, S.S.Panchal, C.J.Priya, SuryavanshiDesai, R.RKheraj, V.AОпанасюк, Анатолій СергійовичОпанасюк, Анатолий СергеевичOpanasiuk, Anatolii Serhiiovych2018-01-022018-01-022017Thickness-dependent electro-chromic properties of amorphous tungsten trioxide thin films / K.J.Patel, G.G. Bhatt, A.S. Opanasyuk [et al.] // 4-th International Symposium on Semiconductor Materials and Devices (ISSMD-4), Kolkata, India. 08-10 March, 2017. – Kolkata, India: Jadavpur University. – Р. 51-52.0000-0002-1888-3935http://essuir.sumdu.edu.ua/handle/123456789/65503Tungsten Trioxide (WO3) thin films were grown by thermal evaporation method to study the effect of film’s thickness on its electrochromic (EC) properties. The WO3thin films of different thicknesses were grown on Indium Tin Oxide (ITO) coated glass and soda lime (bare) glass substrate held at room temperature. The surface composition of the thin films was investigated using X-ray photoelectron spectroscopy measurement, which showed the oxygen to tungsten atomic composition ratio to be nearly 2.97. The EC properties of the thin films were examined using electrochemical techniques. Cyclic-voltammetery shows the diffusion coefficient (D) of the intercalated H+ ion in the WO3 thin film increases with the film’s thickness. It turns out that the ‘thicker’ film exhibits better coloration efficiency (CE) as compared to the ‘thinner’ film. The coloration time was found to be independent of film thickness; however, the bleaching time increases as the film thickness increases.encneтриоксид вольфрамутриоксид вольфрамаtungsten trioxideтонкі плівкитонкие пленкиthin filmsспосіб термічного випаровуванняметод термического испаренияthermal evaporation methodTheses