Zakhvalinskii, V.S.Piljuk, E.A.Goncharov, I.Yu.Rodriges, V.G.Kuzmenko, A.P.Taranenko, S.V.Abakumov, P.A.2014-07-312014-07-312014RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type.http://essuir.sumdu.edu.ua/handle/123456789/36380RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/36380encneAtomic force microscopyRF- magnetron sputteringSilicon carbideSilicon nitrideThin filmsSolar cellsArticle