Features of Electronic Emission from Surface of Dielectric Thin-film Materials with Ion-beam Etching

Abstract

This work presents a series of experimental studies aimed at validating the main theoretical aspects of the ion-electron emission in conditions of ion-beam etching and lookup the possibility of practical realiza-tion of the method of operative control processes ion-beam etching different dielectric thin film materials of electronic technics. In the real article the estimation of influence of the pointed superficial potential is conducted in dielec-tric tape on the integral signal of secondary electrons at an ionic etch. The electric field strength in dielectric film under the influence of the induced potential creates prereq-uisites for the emergence of "Malterovskay" emission, defined by properties actually dielectric and proper-ties of the substrate. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/36276