Журнал нано- та електронної фізики (Journal of nano- and electronic physics)
Permanent URI for this collectionhttps://devessuir.sumdu.edu.ua/handle/123456789/197
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Item Effect of RF-magnetron Sputtering Parameters on the Structure of Hafnium Diboride Films(Sumy State University, 2018) Гончаров, Олександр Андрійович; Гончаров, Александр Андреевич; Honcharov, Oleksandr Andriiovych; Юнда, Андрій Миколайович; Юнда, Андрей Николаевич; Yunda, Andrii Mykolaiovych; Буранич, Володимир Володимирович; Буранич, Владимир Владимирович; Buranych, Volodymyr Volodymyrovych; Шелест, Ігор Владиславович; Шелест, Игорь Владиславович; Shelest, Ihor Vladyslavovych; Лобода, В.Б.The study reports about effect of energy factor on the structure formation of nanocrystalline hafnium diboride films. It was shown, that in the magnetron sputtering the change of energy density Ebi delivered to growing film by bombarding ions occurring due to changing in substrate bias potential Us and ion current density js, leads to the formation of hafnium diboride films with various structural states from nanoclustered to nanocrystalline with a growth texture in plane (0.01) and nanocrystallites size from 2.3 to 20 nm respectively.