Журнал нано- та електронної фізики (Journal of nano- and electronic physics)

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    Study of the Effect of Film Thickness on Structure and Optical Properties of Nanostructured ZnS Thin Films Deposited by Spray Technique
    (Sumy State University, 2019) Ayadi, M.; Sebais, M.; Benramache, S.; Benhaoua, A.; Benhaoua, B.; Halimi, O.; Boudine, B.; Bensouici, A.
    Тонкі плівки ZnS осаджували на скляну підкладку при температурі 400 °C за допомогою ультразвукової хімічної методики розпилення. У роботі ми вивчили вплив товщини плівки на структуру та оптичні властивості наноструктурованих тонких плівок ZnS. XRD аналіз тонких плівок ZnS, який підтвердив гексагональну структуру ZnS, виявив, що максимальний розмір кристалітів 45,3 нм був отриманий при товщині плівки 577 нм. Це підтверджують полікристалічні плівки з великою товщиною. Що стосується оптичних властивостей, то тонкі плівки ZnS мають хорошу прозорість у видимій області; енергія забороненої зони для усіх нанесених плівок змінювалася від 3,9 до 4,1 еВ. При меншій товщині тонкі плівки ZnS стають менш невпорядкованими і мають менше дефектів, пов'язаних з енергією Урбаха 0,19 еВ при 360 нм. Однак зазначається, що коливання коефіцієнта екстинції k слідують тією ж тенденцією, що вказує на те, що мінімальна величина отримана для плівки ZnS, осадженої при 360 нм. Найкраща зміна показника заломлення також була отримана для товщини 360 нм.
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    Effect of Annealing Temperature on Structural, Optical and Electrical Properties of ZnO Thin Films Prepared by Sol-Gel Method
    (Sumy State University, 2018) Benramache, S.; Aoun, Y.; Lakel, S.; Mourghade, H.; Gacem, R.; Benhaoua, B.
    A transparent semiconductor ZnO thin film was prepared on glass substrates using spin coating sol-gel method. The coated ZnO films were annealed in air for 2 hours at different temperatures of 0, 450, 500, 550 and 600 °C. The films were obtained at a concentration of sol-gel solution is 0.5 M. In present paper, the structural, optical and electrical properties of the ZnO thin films were studied as a function of the annealing temperature. The DRX analyses indicated that the coated ZnO films exhibit an hexagonal structure wurtzite and (002) oriented with the maximum value of crystallite size G = 69.32 nm is measured of ZnO film annealed at 600 °C. The crystallinity of the thin films improved at high annealing temperature which was depends too few defects. Spectrophotometer (UV-vis) of a ZnO films deposited at different annealing temperatures shows an average transmittance of about 88 %. The band gap energy decreased after annealing temperature from Eg = 3.359 to 3.117 eV for without annealing and annealed films at 450 °C, respectively, than increased at 600 °C to reaching the maximum value 3.251 eV. The minimum value of the sheet resistance Rsh of the films is 107635 Ω was obtained for ZnO thin film annealed at 600 °C. The best estimated structure, optical and electrical results are achieved in annealed ZnO film at 600 °C.
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    Effect of Sprayed Solution Volume on Structural and Optical Properties of Nickel Oxide Thin Films
    (Sumy State University, 2017) Benhamida, S.; Benhaoua, B.; Barir, R.; Rahal, A.; Benhaoua, A.
    Undoped Nickel oxide (NiO) thin films were deposited on 500 ˚C heated glass using spray pyrolysis technique. Effect of volume sprayed solution on structural and optical properties of NiO thin films was studied. Volume amount was ranged in 5 – 30 ml and stepped by 5ml. X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT-IR) and UV-visible spectrophotometer were used to investigate elaborated thin films. XRD results show that the deposited films with volume lower than 10 ml is amorphous and with increasing volume up to 10 ml NiO thin films structure become polycrystalline with cubic structure and (111) as preferential orientation. An increase in diffraction intensity of preferred peak and narrowing in full width at half maximum were observed with sprayed volume increasing, which leads to better crystallinity of NiO thin films. Also it was observed that the grain size increased with increasing volume solution and were averaged in 10 – 28 nm. FT-IR analysis of product confirms the NiO bond formation and the results were compared with previous studies. All films exhibit an average optical transparency between 50 % and 80 % in the visible range and their band gap values are ranged in 3.38 – 3.62 eV.