Журнал нано- та електронної фізики (Journal of nano- and electronic physics)
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Item Effect of RF-magnetron Sputtering Parameters on the Structure of Hafnium Diboride Films(Sumy State University, 2018) Гончаров, Олександр Андрійович; Гончаров, Александр Андреевич; Honcharov, Oleksandr Andriiovych; Юнда, Андрій Миколайович; Юнда, Андрей Николаевич; Yunda, Andrii Mykolaiovych; Буранич, Володимир Володимирович; Буранич, Владимир Владимирович; Buranych, Volodymyr Volodymyrovych; Шелест, Ігор Владиславович; Шелест, Игорь Владиславович; Shelest, Ihor Vladyslavovych; Лобода, В.Б.The study reports about effect of energy factor on the structure formation of nanocrystalline hafnium diboride films. It was shown, that in the magnetron sputtering the change of energy density Ebi delivered to growing film by bombarding ions occurring due to changing in substrate bias potential Us and ion current density js, leads to the formation of hafnium diboride films with various structural states from nanoclustered to nanocrystalline with a growth texture in plane (0.01) and nanocrystallites size from 2.3 to 20 nm respectively.Item Effect of the Magnetron Sputtering Parameters on the Structure and Substructural Characteristics of Tantalum Diboride Films(Sumy State University, 2017) Гончаров, Олександр Андрійович; Гончаров, Александр Андреевич; Honcharov, Oleksandr Andriiovych; Юнда, Андрій Миколайович; Юнда, Андрей Николаевич; Yunda, Andrii Mykolaiovych; Шелест, Ігор Владиславович; Шелест, Игорь Владиславович; Shelest, Ihor Vladyslavovych; Буранич, Володимир Володимирович; Буранич, Владимир Владимирович; Buranych, Volodymyr VolodymyrovychThe effect of the RF- and DC-magnetron sputtering parameters on the structure and substructural characteristics of protective coatings based on tantalum diboride thin films was studied in this work.The results of the studies showed that the sign and magnitude of the applied bias potential at the use of both types of magnetron sputtering (RF and DC) have a crucial effect on the structure and substructural properties of tantalum diboride films. It was established that nanocrystalline tantalum diboride films of the overstoichiometric composition (CВ/CТа ≈ 2.2-2.6) and having strong growth texture in plane (00.1) were obtained at the bias potential of + 50 V and – 50 V in the RF- and DC-magnetron sputtering respectively. Thus obtained films had the best physico-mechanical properties and general substructural characteristic quantities: nanocristallites size of ~ 30 nm, and increased value of «c» parameter compared with the tabulated.