Журнал нано- та електронної фізики (Journal of nano- and electronic physics)
Permanent URI for this collectionhttps://devessuir.sumdu.edu.ua/handle/123456789/197
Browse
Search Results
Item Effect of the Magnetron Sputtering Parameters on the Structure and Substructural Characteristics of Tantalum Diboride Films(Sumy State University, 2017) Гончаров, Олександр Андрійович; Гончаров, Александр Андреевич; Honcharov, Oleksandr Andriiovych; Юнда, Андрій Миколайович; Юнда, Андрей Николаевич; Yunda, Andrii Mykolaiovych; Шелест, Ігор Владиславович; Шелест, Игорь Владиславович; Shelest, Ihor Vladyslavovych; Буранич, Володимир Володимирович; Буранич, Владимир Владимирович; Buranych, Volodymyr VolodymyrovychThe effect of the RF- and DC-magnetron sputtering parameters on the structure and substructural characteristics of protective coatings based on tantalum diboride thin films was studied in this work.The results of the studies showed that the sign and magnitude of the applied bias potential at the use of both types of magnetron sputtering (RF and DC) have a crucial effect on the structure and substructural properties of tantalum diboride films. It was established that nanocrystalline tantalum diboride films of the overstoichiometric composition (CВ/CТа ≈ 2.2-2.6) and having strong growth texture in plane (00.1) were obtained at the bias potential of + 50 V and – 50 V in the RF- and DC-magnetron sputtering respectively. Thus obtained films had the best physico-mechanical properties and general substructural characteristic quantities: nanocristallites size of ~ 30 nm, and increased value of «c» parameter compared with the tabulated.