Факультет електроніки та інформаційних технологій (ЕлІТ)
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Item Effect of Energy Factors on the Structure and Substructure Characteristics of Hafnium Diboride Films Deposited by RF Magnetron Sputtering(G. V. Kurdyumov Institute for Metal Physics of the N.A.S. of Ukraine, 2020) Гончаров, Максим Миколайович; Гончаров, Максим Николаевич; Honcharov, Maksym Mykolaiovych; Zykov, A.V.; Юнда, Андрій Миколайович; Юнда, Андрей Николаевич; Yunda, Andrii Mykolaiovych; Шелест, Ігор Владиславович; Шелест, Игорь Владиславович; Shelest, Ihor Vladyslavovych; Буранич, Володимир Володимирович; Буранич, Владимир Владимирович; Buranych, Volodymyr VolodymyrovychIn this paper, the influence of energy factors, such as the bias potential, current density, deposition rate, on the formation of the structure and substructure of hafnium diboride films deposited using RF magnetron sputtering is analysed. As shown, the structural changes from a quasi-amorphous to a nanocrystalline state with a growth texture occur due to changes in energy factors.