Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling

dc.contributor.authorДворниченко, Аліна Василівна
dc.contributor.authorДворниченко, Алина Васильевна
dc.contributor.authorDvornychenko, Alina Vasylivna
dc.date.accessioned2021-07-20T12:53:57Z
dc.date.available2021-07-20T12:53:57Z
dc.date.issued2021
dc.description.abstracthe epitaxial growth of thin films with regard for the anisotropy of the adsorbate surface dif-fusion induced by electromigration effects has been studied theoretically in the framework ofthe phase-field theory and with the use of numerical simulations. The influence of the coef-ficient of electromigration-induced anisotropic diffusion, which is proportional to the appliedelectric field strength, on the dynamics of growth of the film thickness and the height of sur-face structures, growing surface morphology, statistical characteristics of the surface multilayeradsorbate structures, and distribution of surface structures over their heights is revealed.en_US
dc.identifier.citationDvornichenko, A. (2021). Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling. Ukrainian Journal of Physics, 66(5), 439. https://doi.org/10.15407/ujpe66.5.439en_US
dc.identifier.sici0000-0003-4530-4262en
dc.identifier.urihttps://essuir.sumdu.edu.ua/handle/123456789/84695
dc.language.isoenen_US
dc.publisherDepartment of Physics and Astronomy of the National Academy of Sciences of Ukraineen_US
dc.rights.uriCC BY 4.0en_US
dc.subjecthase-field methoden_US
dc.subjectepitaxial growthen_US
dc.subjectsurface structuresen_US
dc.subjectelectromigrationen_US
dc.subjectnumerical simulationen_US
dc.subjectstatistical characteristicsen_US
dc.titleElectromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modelingen_US
dc.typeArticleen_US

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