Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling
dc.contributor.author | Дворниченко, Аліна Василівна | |
dc.contributor.author | Дворниченко, Алина Васильевна | |
dc.contributor.author | Dvornychenko, Alina Vasylivna | |
dc.date.accessioned | 2021-07-20T12:53:57Z | |
dc.date.available | 2021-07-20T12:53:57Z | |
dc.date.issued | 2021 | |
dc.description.abstract | he epitaxial growth of thin films with regard for the anisotropy of the adsorbate surface dif-fusion induced by electromigration effects has been studied theoretically in the framework ofthe phase-field theory and with the use of numerical simulations. The influence of the coef-ficient of electromigration-induced anisotropic diffusion, which is proportional to the appliedelectric field strength, on the dynamics of growth of the film thickness and the height of sur-face structures, growing surface morphology, statistical characteristics of the surface multilayeradsorbate structures, and distribution of surface structures over their heights is revealed. | en_US |
dc.identifier.citation | Dvornichenko, A. (2021). Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling. Ukrainian Journal of Physics, 66(5), 439. https://doi.org/10.15407/ujpe66.5.439 | en_US |
dc.identifier.sici | 0000-0003-4530-4262 | en |
dc.identifier.uri | https://essuir.sumdu.edu.ua/handle/123456789/84695 | |
dc.language.iso | en | en_US |
dc.publisher | Department of Physics and Astronomy of the National Academy of Sciences of Ukraine | en_US |
dc.rights.uri | CC BY 4.0 | en_US |
dc.subject | hase-field method | en_US |
dc.subject | epitaxial growth | en_US |
dc.subject | surface structures | en_US |
dc.subject | electromigration | en_US |
dc.subject | numerical simulation | en_US |
dc.subject | statistical characteristics | en_US |
dc.title | Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling | en_US |
dc.type | Article | en_US |
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