Prospects of III-Vs for Logic Applications

dc.contributor.authorGomes, U.P.
dc.contributor.authorYadav, Y.K.
dc.contributor.authorChowdhury, S.
dc.contributor.authorRanjan, K.
dc.contributor.authorRathi, S.
dc.contributor.authorBiswas, D.
dc.date.accessioned2012-08-27T12:46:41Z
dc.date.available2012-08-27T12:46:41Z
dc.date.issued2012
dc.description.abstractThe increasing challenges for further scaling down of Si CMOS require the study of alternative channel materials. This paper highlights the significance of III-V compound semiconductor materials in order to face the looming fate of Si CMOS technology. The potential advantages of using III-Vs as channel materials for future III-V CMOS is its outstanding transport properties that have been widely accepted in high frequency RF applications. However, many significant challenges in front of III-V digital technology needs to be overcome before III-V CMOS becomes feasible for next generation high speed and low power logic applications. But it may be that this situation is changing given recent progress in the fabrication of high-mobility III-Vs based heterostructure electronic devices for logic applications to fulfill the needs towards the everyday evolving III-V CMOS technology. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/27780ru_RU
dc.identifier.citationU.P. Gomes, Y.K. Yadav, S. Chowdhury, et al., J. Nano-Electron. Phys. 4 No 2, 02009 (2012)ru_RU
dc.identifier.urihttp://essuir.sumdu.edu.ua/handle/123456789/27780
dc.language.isoenru_RU
dc.publisherСумський державний університетru_RU
dc.rights.uricneen_US
dc.subjectCMOSru_RU
dc.subjectIII-V Materialsru_RU
dc.subjectHEMTru_RU
dc.subjectLogicru_RU
dc.subjectDigitalru_RU
dc.titleProspects of III-Vs for Logic Applicationsru_RU
dc.typeArticleru_RU

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