Effect of Annealing on Magnetic and Structural Properties of FeNi Thin Films

Abstract

In this work, we have deposited FeNi (60 nm) film on Si (111) substrate using electron beam evaporation technique. XRD measurements carried out on thin film with annealing the sample from 100 to 400 °C show increase in intensity of the FeNi (111) diffraction peak. The particle size increases from 19 nm (as deposited sample) to 27 nm (400 °C) with annealing. The magnetization measurements carried out using MOKE technique show enhancement in coercivity with annealing. The overall results are attributed in terms of annealing induced structural change which modify the magnetic properties.