Control of Ion Density Distribution by Use of Magnetic Traps for Plasma Electrons

Abstract

Method of ion current density control in the vacuum arc deposition setup has been investigated. The control unit consisted of two electromagnetic coils installed under substrate of 400 mm dia. exposed to the plasma flux. A planar probe was used to measure the ion current density distribution along the plasma flux cross-sections at different distances from the plasma duct exit. It was shown that configuration of the resulting magnetic field generated by the control coils and the guiding and focusing coils of the arc source, strongly affects the ion current density distribution. Broad range of ion current density from 25 to 340 A/m2 was obtained at dependence on the control coils powering, distance from the plasma duct exit and the position along the substrate. This method may be suitable for effective controlling of the ion flux extracted from the plasma sources with guiding magnetic field, over the large substrates. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35384