Plasma Processing Reactor on a Base of Beam Plasma Discharge for Producing and Processing Nanomaterials

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Title	Plasma Processing Reactor on a Base of Beam Plasma Discharge for Producing and Processing Nanomaterials
Authors	Shustin, E.G. Isaev, N.V. Klykov, I.L. Peskov, V.V.
ORCID
Keywords	Plasma processing reactor Beam plasma discharge Etching Deposition Graphene
Type	Conference Papers
Date of Issue	2012
URI	http://essuir.sumdu.edu.ua/handle/123456789/35407
Publisher	Sumy State University
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Citation	Plasma Processing Reactor on a Base of Beam Plasma Discharge for Producing and Processing Nanomaterials / E. G. Shustin, N. V. Isaev, I. L. Klykov, V. V. Peskov // Nanomaterials: Applications & Properties (NAP-2012) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy : Sumy State University, 2012. - V. 1, No4. - 04PITSE08
Abstract	The paper describes the design, modes and applications of novel kind of low pressure plasma processing reactor based on beam plasma discharge as the plasma source. This reactor ensures flawless treatment of material surface as well as deposition of specific coatings with strictly defined energy of ions acting upon a treated surface. Applications of the reactor are represented such as defect-free etching heterostructures based on GaAs and producing structurally perfect samples of graphene. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35407
Appears in Collections:	Наукові видання (ЕлІТ)