Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/37153
Title: Structure and Properties NbN and Nb-Si-N Deposited by Magnetron Sputtering
Authors: Ivashchenko, V.I.
Scrynskyy, P.L.
Lytvyn, O.S.
Rogoz, V.M.
Sobol, O.V.
Kuzmenko, A.P.
Keywords: AFM
XRD
NbN
Nb-Si-N
XPS
Issue Year: 2014
Publisher: Sumy State University
Citation: Proc. NAP 3, 01NTF22 (2014)
Abstract: NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltage, Us. The films were investigated by an atomic force microscope (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and nanoindentation. The deposited films were annealed to establish their thermal stability. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNx nanocrystallites embedded into the amorphous Si3N4 tissue (nc-δ-NbNx/a-Si3N4).
URI: http://essuir.sumdu.edu.ua/handle/123456789/37153
Type: Article
Appears in Collections:Наукові видання (ЕлІТ)

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