Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/37155
Title: Thermal conditions of technological plasma sources cathodes
Authors: Sysoiev, Yu.A.
Tsaglov, А.I.
Khaustova, А.N.
Keywords: Vacuum-arc plasma source cathode
Plasma flow composition
Plasma flow composition
Cathode stationary thermal field
Time to reach stationary thermal regime.
Issue Year: 2014
Publisher: Sumy State University
Citation: Proc. NAP 3, 01NTF03 (2014)
Abstract: Were determined thermal conditions of vacuum-arc plasma sources cathodes.Stationary thermal field of the cathode with refrigeration was researched along both later a landend surfaces having different geometry of cathodes and thermal flows onto the operating surfaces.Was detected non uniformity of cathode operational surface temperature distribution along its radius. This non uniformity is greater for the cathode with refrigeration along the side surface and it can be minimized to several degrees range by changing the geometry of the cathode.Weredetermined time periods for cathodes with different refrigeration types reaching stationary thermal regime depending on cathodes’ geometry and arc current.
URI: http://essuir.sumdu.edu.ua/handle/123456789/37155
Type: Article
Appears in Collections:Наукові видання (ЕлІТ)

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