Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/37232
Title: Development of Magnetic Field-enhanced Vacuum Arc Deposition in China
Authors: Zhao, Ya.
Lang, W.C.
Xiao, J.Q.
Yu, B.H.
Gong, J.
Sun, C.
Keywords: Vacuum arc deposition
Magnetic field
Cathode spot motion
Droplet-particles reduction
Issue Year: 2014
Publisher: Sumy State University
Citation: Proc. NAP 3, 01PISERE01 (2014)
Abstract: This paper reviews the latest research and development in China for magnetic field-enhanced vacuum arc deposition (MFE-VAD). China has developed some new technologies in MFE-VAD. These technologies are all based on the interaction between the magnetic field and cathode arc spot (and arc plasma). An external magnetic field can be applied to steer the cathode spot motion including axisymmetric magnetic field (AMF), transverse rotating magnetic field (TRMF) and coupling magnetic field (CMF). The transverse component of AFM can accelerate the cathode spot motion. The TRMF covered the whole cathode was generated by stationary three-phase windings carrying three-phase alternating currents. The CMF was designed to improve the increasing of plasma density and the collisions between ion and droplet-particls (DPs) charging, and as well as further purify the DPs.
URI: http://essuir.sumdu.edu.ua/handle/123456789/37232
Type: Article
Appears in Collections:Наукові видання (ЕлІТ)

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