Please use this identifier to cite or link to this item:
http://essuir.sumdu.edu.ua/handle/123456789/3912
Or use following links to share this resource in social networks:
Tweet
Recommend this item
Title | Application of focused charge‐particle beams of in manufacturing of nanocomponents |
Authors |
Vorobiov, Hennadii Saveliiovych
Ponomarev, А.G. Ponomareva, А.А. Drozdenko, Oleksii Oleksandrovych ![]() Rybalko, А.А. |
ORCID |
http://orcid.org/0000-0002-0047-739X |
Keywords |
manufacturing focused beam nanoelectronics beam litography |
Type | Article |
Date of Issue | 2010 |
URI | http://essuir.sumdu.edu.ua/handle/123456789/3912 |
Publisher | Telecommunications and Radio Engineering |
License | |
Citation | Application of focused charge-particle beams of in manufacturing of nanocomponents[Текст] /G.S.Vorobyov, А.G.Ponomarev, А.А.Ponomareva [та ін.] // Telecommunications and Radio Engineering. — 2010. — №69(4). — pp. 355-365 |
Abstract |
Application of focused beams of medium energy light ions, electrons and low energy heavy ions is considered for the technology of manufacturing of small-dimension components. Physical principles applied as the basis for interaction of the above beams with resistive materials are described. The proton beam lithography is considered as a new technology possessing high potential capabilities for various applications like micro-optics and nanoelectronics of terahertz wave band.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/3912 |
Appears in Collections: |
Наукові видання (ЕлІТ) |
Views
![Canada](/flags/ca.gif)
1
![China](/flags/cn.gif)
-30103391
![Czechia](/flags/cz.gif)
1
![France](/flags/fr.gif)
2
![Germany](/flags/de.gif)
1066224244
![Greece](/flags/gr.gif)
1
![Hungary](/flags/hu.gif)
1
![Iran](/flags/ir.gif)
1
![Ireland](/flags/ie.gif)
7004192
![Italy](/flags/it.gif)
1
![Japan](/flags/jp.gif)
1
![Lithuania](/flags/lt.gif)
1
![Netherlands](/flags/nl.gif)
40939
![Russia](/flags/ru.gif)
18
![Singapore](/flags/sg.gif)
1
![Sweden](/flags/se.gif)
1
![Turkey](/flags/tr.gif)
4
![Ukraine](/flags/ua.gif)
67537939
![United Kingdom](/flags/gb.gif)
29882345
![United States](/flags/us.gif)
-983810769
![Unknown Country](/flags/--.gif)
67537938
![Vietnam](/flags/vn.gif)
703725
Downloads
![Canada](/flags/ca.gif)
1
![China](/flags/cn.gif)
893500594
![Denmark](/flags/dk.gif)
1
![France](/flags/fr.gif)
21945360
![Germany](/flags/de.gif)
202605994
![India](/flags/in.gif)
2340239
![Ireland](/flags/ie.gif)
14008376
![Italy](/flags/it.gif)
1
![Japan](/flags/jp.gif)
2
![Lithuania](/flags/lt.gif)
1
![Portugal](/flags/pt.gif)
1
![Russia](/flags/ru.gif)
10
![South Africa](/flags/za.gif)
1
![South Korea](/flags/kr.gif)
1
![Ukraine](/flags/ua.gif)
67537940
![United Kingdom](/flags/gb.gif)
21945358
![United States](/flags/us.gif)
-983810768
![Unknown Country](/flags/--.gif)
365
![Vietnam](/flags/vn.gif)
1
Files
File | Size | Format | Downloads |
---|---|---|---|
Application of focused charge-particle beams of in manufacturing of nanocomponents .pdf | 1,04 MB | Adobe PDF | 240073478 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.