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Title: Structure and Physicomechanical Properties of Nanostructured (TiHfZrNbVTa)N Coatings after Implantation of High Fluences of N+ (1018 cm−2)
Authors: Pohrebniak, Oleksandr Dmytrovych 
Bondar, Oleksandr Viacheslavovych 
Borba, Svitlana Oleksandrivna
Piotrowska, K.
Boiko, O.
Keywords: high-entropy alloys
Issue Year: 2017
Publisher: Polish Academy of Science, Institute of Physics
Citation: Structure and Physicomechanical Properties of Nanostructured (TiHfZrNbVTa)N Coatings after Implantation of High Fluences of N+ (1018 cm−2) [Text] / A.D. Pogrebnjak, O.V. Bondar, S.O. Borba [et al.] // Acta physica polonica A. - 2017. - Vol. 132. - №2. - С. 217-221. - DOI: 10.12693/APhysPolA.132.217
Abstract: New classes of high-entropy alloys, which consist of at least 5 main elements with atomic concentrations 5– 35 at.%, are under great interest in modern material science. It is also very important to explore the limits of resistance of high-entropy alloy nitrides to implantation by high-energy atoms. Structure and properties of na- nostructured multicomponent (TiHfZrNbVTa)N coatings were investigated before and after ion implantation. We used the Rutherford backscattering, scanning electron microscopy with energy dispersive X-ray spectroscopy, high resolution transmission electron microscopy and scanning transmission electron microscopy with local microanalysis, X-ray diffraction and nanoindentation for investigations. Due to the high-fluence ion implantation (N+, the fluence was 1018 cm−2) a multiphase structure was formed in the surface layer of the coating. This structure consisted of amorphous, nanocrystalline and initial nanostructured phases with small sizes of nanograins. Two phases were formed in the depth of the coating: fcc and hcp (with a small volume fraction). Nitrogen concentration reached 90 at.% near the surface and decreased with the depth. Nanohardness of the as-deposited coatings varied from 27 to 34 GPa depending on the deposition conditions. However, hardness decreased to a value of 12 GPa of the depth of the projected range after ion implantation and increased to 23 GPa for deeper layers.
Type: Article
Appears in Collections:Наукові видання (ЕлІТ)


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