Thin overlayer influence on electrophysical properties of nickel films

dc.contributor.authorЧорноус, Анатолій Миколайович
dc.contributor.authorЧорноус, Анатолий Николаевич
dc.contributor.authorChornous, Anatolii Mykolaiovych
dc.contributor.authorГоворун, Тетяна Павлівна
dc.contributor.authorГоворун, Татьяна Павловна
dc.contributor.authorHovorun, Tetiana Pavlivna
dc.date.accessioned2010-12-17T11:25:17Z
dc.date.available2010-12-17T11:25:17Z
dc.date.issued2006
dc.description.abstractIn this work it is experimentally investigated a size effect in temperature coefficient of resistance (TCR) of Ni films with Cu and Si02 thin overiayer. The parameters of electrical transfer (the mean-free path of electron, the reflectivity coefficient of the external surfaces, the reflection and transmission coefficients at the grain boundary) were calculations. Decreasing of the value of the reflectivity coefficient is due to the change of the surface microrelief. It is show that the value of TCR decreases caused by the conditions of scattering changes on internal and external boundaries. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/583ru_RU
dc.identifier.citationHovorun T. Thin overlayer influence on electrophysical properties of nickel films [Text] / T. Hovorun, A. Chornous // Cryst. Res. Technol. 41, No 5, 458 - 463 (2006).ru_RU
dc.identifier.sici0000-0002-5009-5445en
dc.identifier.urihttp://essuir.sumdu.edu.ua/handle/123456789/583
dc.language.isoenru_RU
dc.publisherWILEY-VCH Verlag GmbH & Co. KGaA, Weinheimru_RU
dc.rights.uricneen_US
dc.subjectthin filmsru_RU
dc.subjectresistivityru_RU
dc.subjectreflection coefficientru_RU
dc.subjectтонкі плівкиru_RU
dc.subjectпитомий опірru_RU
dc.subjectкоефіцієнт відбиттяru_RU
dc.subjectтонкие пленкиru_RU
dc.subjectудельное сопротивлениеru_RU
dc.subjectкоэффициент отраженияru_RU
dc.titleThin overlayer influence on electrophysical properties of nickel filmsru_RU
dc.typeArticleru_RU

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