Temperature Influence on the Properties of Thin Si3N4 Films
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Date
2015
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Sumy State University
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Abstract
Applying Raman spectroscopy, small-angle x-ray scattering, and atomic force microscopy it were studied
phase composition and surface morphology of nanoscale films Si3N4 (obtained by RF magnetron sputtering).
Keywords
raman spectroscopy, small-angle x-ray scattering, atomic force microscopy
Citation
Zakhvalinskii, V.S. Temperature Influence on the Properties of Thin Si3N4 Films [Текст] / V.S. Zakhvalinskii, P.V. Abakumov, A.P. Kuzmenko et al. // Журнал нано- та електронної фізики. — 2015. — Т.7, №4. — 04052-1.