Temperature Influence on the Properties of Thin Si3N4 Films
| dc.contributor.author | Zakhvalinskii, V.S. | |
| dc.contributor.author | Abakumov, P.V. | |
| dc.contributor.author | Kuzmenko, A.P. | |
| dc.contributor.author | Chekadanov, A.S. | |
| dc.contributor.author | Piljuk, E.A. | |
| dc.contributor.author | Rodriguez, V.G. | |
| dc.contributor.author | Goncharov, I.J. | |
| dc.contributor.author | Taran, S.V. | |
| dc.date.accessioned | 2015-12-21T12:04:17Z | |
| dc.date.available | 2015-12-21T12:04:17Z | |
| dc.date.issued | 2015 | |
| dc.description.abstract | Applying Raman spectroscopy, small-angle x-ray scattering, and atomic force microscopy it were studied phase composition and surface morphology of nanoscale films Si3N4 (obtained by RF magnetron sputtering). | ru_RU |
| dc.identifier.citation | Zakhvalinskii, V.S. Temperature Influence on the Properties of Thin Si3N4 Films [Текст] / V.S. Zakhvalinskii, P.V. Abakumov, A.P. Kuzmenko et al. // Журнал нано- та електронної фізики. — 2015. — Т.7, №4. — 04052-1. | ru_RU |
| dc.identifier.uri | http://essuir.sumdu.edu.ua/handle/123456789/43269 | |
| dc.language.iso | en | ru_RU |
| dc.publisher | Sumy State University | ru_RU |
| dc.rights.uri | cne | en_US |
| dc.subject | raman spectroscopy | ru_RU |
| dc.subject | small-angle x-ray scattering | ru_RU |
| dc.subject | atomic force microscopy | ru_RU |
| dc.title | Temperature Influence on the Properties of Thin Si3N4 Films | ru_RU |
| dc.type | Article | ru_RU |
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