Structural and Mechanical Properties of Nanocomposite Nb-Al-N Films
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Date
2014
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Sumy State University
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Abstract
Nb-Al-N films were deposited by magnetron sputtering of the Nb and Al targets in the Ar-N2 atmosphere on silicon wafers at various currents supplied to the magnetron device with the Al target (IAl=100, 150, 200, 300 mA). The films were studied with XRD, FTIR spectroscopy, as well by nanoindentation and Knoop indentation tests. The films were found to have the nanocomposite nc-B1-NbNx/a-AlN structure and exhibit the nanohardness and Knoop hardness in the ranges of 29-33.5 GPa and 46-48 GPa, respectively. The hardness and elastic modulus has an extreme dependence on IAl.
Keywords
Nb-Al-N films, AlN films, Magnetron sputtering, Film structure, Mechanical properties, Nanoindentation
Citation
Proc. NAP 3, 01NTF17 (2014)