RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells
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Date
2014
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Sumy State University
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Abstract
RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used
for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based
on substrates of single crystal silicon of p-type.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/36380
Keywords
Atomic force microscopy, RF- magnetron sputtering, Silicon carbide, Silicon nitride, Thin films, Solar cells
Citation
RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used
for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based
on substrates of single crystal silicon of p-type.