RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells

dc.contributor.author	Zakhvalinskii, V.S.
dc.contributor.author	Piljuk, E.A.
dc.contributor.author	Goncharov, I.Yu.
dc.contributor.author	Rodriges, V.G.
dc.contributor.author	Kuzmenko, A.P.
dc.contributor.author	Taranenko, S.V.
dc.contributor.author	Abakumov, P.A.
dc.date.accessioned	2014-07-31T11:55:10Z
dc.date.available	2014-07-31T11:55:10Z
dc.date.issued	2014
dc.description.abstract	RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/36380	ru_RU
dc.identifier.citation	RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type.	ru_RU
dc.identifier.uri	http://essuir.sumdu.edu.ua/handle/123456789/36380
dc.language.iso	en	ru_RU
dc.publisher	Sumy State University	ru_RU
dc.rights.uri	cne	en_US
dc.subject	Atomic force microscopy	ru_RU
dc.subject	RF- magnetron sputtering	ru_RU
dc.subject	Silicon carbide	ru_RU
dc.subject	Silicon nitride	ru_RU
dc.subject	Thin films	ru_RU
dc.subject	Solar cells	ru_RU
dc.title	RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells	ru_RU
dc.type	Article	ru_RU

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