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| Issue Year | Title | Author(s) | Type | Views | Downloads |
|---|---|---|---|---|---|
| 2017 | Effect of the Magnetron Sputtering Parameters on the Structure and Substructural Characteristics of Tantalum Diboride Films | Honcharov, Oleksandr Andriiovych; Yunda, Andrii Mykolaiovych; Shelest, Ihor Vladyslavovych; Buranych, Volodymyr Volodymyrovych | Article | 601424978 | 1036801789 |