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| Issue Year | Title | Author(s) | Type | Views | Downloads |
|---|---|---|---|---|---|
| 2021 | Effect of High-k Dielectric Materials on Short Channel Effects of a 14 nm Tri-Gate SOI FinFET for Reduced Area on Chip | Nanda, S.; Dhar, R.S. | Article | 1437137230 | -2070228341 |