Temperature rise of film condensation surface as a phenomenon intrinsic to vacuum deposition methods

Abstract

By means of in situ measurement of the temperature of condensation surface by two independent methods during deposition of various materials by magnetron sputtering it was revealed that it is noticeably higher than that of the substrate and linearly increases with increasing of the deposition rate of the film. This effect is explained by the idea that intermediate liquid-like layer forms on the boundary between the vapor and solid (film) phases, that exists exceptionally during arrival of sputtered species on the condensation surface. Calculations based on the experimental results show that thermal conductivity of the layer is 8-10 orders of magnitude lower than that for bulk materials. The existence of a layer with such thermal properties provides observing temperature difference between condensation surface and substrate. The suggested simple quantitative film growth model is in a good agreement with experimental results and is invariant relative the film deposition technique. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/20646