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Title Structure of TiAlN Reactive Sputtered Coatings
Authors Denisov, V.N.
Mavrin, B.N.
Vinogradov, E.A.
Polyakov, S.N.
Kirichenko, A.N.
Gogolinsky, K.V.
Useinov, A.S.
Blank, V.D.
Godinho, V.
Philippon, D.
Fernandez, A.
ORCID
Keywords Coating
Hardness
Reactive Sputtering
TiAlN
Type Article
Date of Issue 2012
URI http://essuir.sumdu.edu.ua/handle/123456789/24922
Publisher Видавництво СумДУ
License
Citation V.N. Denisov, B.N. Mavrin, E.A. Vinogradov, et al. J. Nano-Electron. Phys. 4 No 1, 01021 (2012)
Abstract The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm 1 or in the region of 830 850 cm 1 depending on the deposition parameters whereas it is not exceed 630 cm 1 from TiAlN of NaCl structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiNx] with x = 5 and x = 4. The chains of polyhedra [TiNx] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N2 gas. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/24922
Appears in Collections: Журнал нано- та електронної фізики (Journal of nano- and electronic physics)

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